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For the Inventor, By the Inventor

Touten, Taiwan

Wen-Kung Cheng

USPTO Granted Patents = 13

Average Co-Inventor Count = 5.2

ph-index = 5

Forward Citations = 116(Granted Patents)


Location History:

  • Foufen, TW (2001)
  • Mai-Li, TW (2002)
  • Miao-Li, TW (2003)
  • Toufen, TW (2000 - 2005)
  • Touten, TW (2003 - 2006)
  • Toufen Township, TW (2010)
  • Toufen Township, Miaoli County, TW (2016)

Company Filing History:

goldMedal13 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2000-2016

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13 patents (USPTO):
1. 9287151 - Systems and method for transferring a semiconductor substrate (2016-03-15),
2. 7772625 - Image sensor having an RPO layer containing nitrogen (2010-08-10),
3. 7125802 - CMP process leaving no residual oxide layer or slurry particles (2006-10-24),
4. 6903019 - CMP process leaving no residual oxide layer or slurry particles (2005-06-07),
5. 6713407 - Method of forming a metal nitride layer over exposed copper (2004-03-30),
6. 6660638 - CMP process leaving no residual oxide layer or slurry particles (2003-12-09),
7. 6602560 - Method for removing residual fluorine in HDP-CVD chamber (2003-08-05),
8. 6584987 - Method for improved cleaning in HDP-CVD process with reduced NF3 usage (2003-07-01),
9. 6558228 - Method of unloading substrates in chemical-mechanical polishing apparatus (2003-05-06),
10. 6499222 - Template for measuring edge width and method of using (2002-12-31),
11. 6323141 - Method for forming anti-reflective coating layer with enhanced film thickness uniformity (2001-11-27),
12. 6235653 - Ar-based si-rich oxynitride film for dual damascene and/or contact etch stop layer (2001-05-22),
13. 6136680 - Methods to improve copper-fluorinated silica glass interconnects (2000-10-24),

Title: The Innovative Contributions of Wen-Kung Cheng

Introduction

Wen-Kung Cheng, a prominent inventor based in Touten, Taiwan, has made significant strides in semiconductor technology. With 13 patents to his name, Cheng's innovations have advanced the field, particularly in systems and methods for handling semiconductor substrates.

Latest Patents

Among Cheng's latest patents is a method for transferring a semiconductor substrate, which outlines the process of loading a semiconductor substrate from a chamber to a transfer module. This method includes detecting both the center and the notch of the substrate, ensuring precise handling as it is transferred to a process chamber. Another noteworthy patent is the development of an image sensor featuring a resist protection oxide (RPO) layer that contains nitrogen, which helps enhance the performance of semiconductor structures.

Career Highlights

Wen-Kung Cheng is currently employed with Taiwan Semiconductor Manufacturing Company Ltd., a leader in the semiconductor industry. His contributions to the field are recognized for their impact on how semiconductor substrates are processed and managed, showcasing his expertise and commitment to innovation.

Collaborations

Throughout his career, Cheng has collaborated with esteemed coworkers, including Ying-Lang Wang and Yi-Lung Cheng. Working together, they have pushed the boundaries of current technologies, fostering an environment of creativity and technical advancement in semiconductor manufacturing.

Conclusion

Wen-Kung Cheng's work is a testament to the importance of innovation in technology. With a solid portfolio of patents and a collaborative spirit, he continues to be an influential figure in the semiconductor industry, contributing to advancements that shape the future of electronic devices.

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