Luodong, Taiwan

Wen-Hung Tseng

This inventor holds 10 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Hung Tseng. Retrieved from https://idiyas.com/inventor/wen-hung-tseng-jm0dec8n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 80.0

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Juochiao Town, TW (2007)
  • Hsin-Chu, TW (2015)
  • Luodong Township, Yilan County, TW (2015)
  • Yilan County, TW (2018 - 2021)
  • Luodong Township, TW (2015 - 2023)

Company Filing History:


Years Active: 2007-2023

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10 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology: The Contributions of Wen-Hung Tseng

Introduction

Wen-Hung Tseng is a prominent inventor based in Luodong, Taiwan, known for his significant contributions to the field of semiconductor technology. With a remarkable track record of holding 10 patents, Tseng has played a pivotal role in advancing the manufacturing processes of integrated circuits and FinFET devices. His innovative methods not only enhance efficiency but also push the boundaries of what is possible in semiconductor fabrication.

Latest Patents

Among Tseng's latest patents, two stand out for their complexity and impact on the industry. The first is a novel method of semiconductor integrated circuit fabrication. This method involves the creation of a first conductive feature, followed by the formation of a hard mask. The process includes the development of layered dielectric material and the intricate arrangement of metal plugs to establish connections between various conductive components.

The second patent focuses on a method for making FinFET devices. This innovative technique encompasses the formation of mandrel features on a substrate, followed by a series of precise cuts to create spaces and fins. The approach includes the deposition of a spacer layer to fill the gaps between the fins and the formation of sidewall spacers, which are crucial for ensuring device isolation.

Career Highlights

Wen-Hung Tseng's career is marked by his ongoing tenure at Taiwan Semiconductor Manufacturing Company Ltd., where he has contributed significantly to research and development. His expertise in semiconductor processes has positioned him as a key player in the industry. Tseng’s dedication to innovation has led to notable advancements in the performance and manufacturing of semiconductor devices.

Collaborations

Throughout his career, Tseng has fostered collaborations with talented colleagues, including Ming-Feng Shieh and Hung-Chang Hsieh. Their teamwork reflects a combination of creativity and technical skill, which is essential for driving forward innovative projects within the semiconductor field.

Conclusion

Wen-Hung Tseng's contributions to the semiconductor industry exemplify the power of innovation in technology. His patents not only represent his ingenuity but also serve as a foundation for future advancements in integrated circuit fabrication and FinFET device technology. As technology continues to evolve, Tseng remains an influential figure in shaping the landscape of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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