Weiyuan Yang

Title: Weiyuan Yang: Innovator in Embedded Structures

Introduction

Weiyuan Yang is a prominent inventor based in Zhuhai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of embedded structures for capacitors and inductors. With a total of 2 patents to his name, Yang continues to push the boundaries of innovation in his field.

Latest Patents

Yang's latest patents include a "Capacitor and Inductor Embedded Structure and Manufacturing Method Therefor" and a "Substrate." These patents detail a method that involves providing a metal plate and sequentially depositing and etching various layers to form a thin film capacitor and its associated components. The process includes pressing dielectric layers, etching to create electrodes, and electroplating to form inductor and circuit layers. Additionally, he has developed an embedded packaging method that facilitates heat dissipation, which involves using a frame with through holes and photosensitive insulating materials to create circuit layers.

Career Highlights

Weiyuan Yang is currently employed at Zhuhai Access Semiconductor Co., Ltd., where he applies his expertise in semiconductor technology. His work focuses on innovative methods that enhance the performance and efficiency of electronic components. Yang's contributions have been instrumental in advancing the capabilities of embedded structures in the semiconductor industry.

Collaborations

Yang collaborates with notable colleagues, including Benxia Huang and Lei Feng. Their combined efforts contribute to the ongoing research and development in the field of semiconductor technology.

Conclusion

Weiyuan Yang is a key figure in the innovation of embedded structures within the semiconductor industry. His patents and career achievements reflect his commitment to advancing technology and improving electronic components.