Company Filing History:
Years Active: 2000-2001
Title: Weiching Horng: Innovator in Anti-Reflection Coating Technologies
Introduction
Weiching Horng is a notable inventor based in Tai-Chung, Taiwan. He has made significant contributions to the field of anti-reflection coating technologies, holding a total of 3 patents. His innovative methods have advanced the precision and effectiveness of coating applications in various industries.
Latest Patents
Horng's latest patents include a method of stabilizing an anti-reflection coating (ARC) layer. This method involves providing a substrate with a dielectric layer, a conductive layer, and the ARC layer formed thereon. The ARC layer undergoes an alloy treatment step prior to the formation of a photoresist layer, ensuring the specificity of the ARC layer is stabilized for accurate pattern transfer. Another patent details a similar method, where the ARC layer is treated in a ultraviolet (UV) curing step before the photoresist layer is applied. This process allows for the precise replication of a desired pattern in the photoresist layer.
Career Highlights
Throughout his career, Weiching Horng has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and United Semiconductor Corporation. His experience in these organizations has contributed to his expertise in developing advanced coating technologies.
Collaborations
Horng has collaborated with notable professionals in his field, including Kan-Yuan Lee and Joe Ko. These partnerships have fostered innovation and the sharing of ideas, further enhancing the development of anti-reflection coating technologies.
Conclusion
Weiching Horng's contributions to the field of anti-reflection coatings demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in coating technologies, positioning him as a key figure in this area of research.