Sunnyvale, CA, United States of America

Wei-Jen Hsia



Average Co-Inventor Count = 3.1

ph-index = 12

Forward Citations = 685(Granted Patents)


Location History:

  • Saratoga, CA (US) (2006 - 2007)
  • Sunnyvale, CA (US) (1994 - 2008)

Company Filing History:


Years Active: 1994-2008

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36 patents (USPTO):Explore Patents

Title: **Wei-Jen Hsia: Innovator in Semiconductor Technology**

Introduction

Wei-Jen Hsia, an accomplished inventor based in Sunnyvale, CA, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 36 patents, he has demonstrated his expertise and innovation in developing processes that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among Wei-Jen Hsia's latest inventions are groundbreaking techniques aimed at improving semiconductor functionality. One notable patent focuses on "Dual layer barrier film techniques to prevent resist poisoning." This process involves forming a barrier film designed to prevent resist poisoning in a semiconductor device by depositing a second barrier layer, which is nitrogen-free, atop a first barrier layer containing nitrogen. The resulting low-k dielectric layer, formed over the second barrier layer, helps maintain low electrical leakage characteristics while reducing nitrogen poisoning of a subsequently applied photoresist layer.

Another important patent involves "Incorporating dopants to enhance the dielectric properties of metal silicates." This invention provides a method for forming a high-k dielectric layer on a semiconductor wafer. Initially, a metal silicate dielectric layer is deposited on the wafer, into which a dopant with dissociable oxygen is introduced. The metal silicate can include a group IV metal, with the dopant being an oxide of either an alkaline metal or an alkaline earth metal, while some embodiments may employ a group III metal.

Career Highlights

Throughout his career, Wei-Jen Hsia has been associated with prominent companies in the semiconductor industry, including LSI Logic Corporation and LSI Corporation. His work has not only contributed to the advancement of semiconductor processes but has also helped model future technologies in the industry.

Collaborations

Wei-Jen's innovative journey has seen collaborations with accomplished colleagues, such as Wilbur G. Catabay and Joe W. Zhao. Their combined expertise has undoubtedly facilitated the development of cutting-edge technologies in semiconductor research.

Conclusion

Wei-Jen Hsia stands out as a leading inventor in the semiconductor field, with a wealth of patents that reflect his dedication to innovation. His latest work continues to push the boundaries of semiconductor technology, ensuring that he remains a prominent figure in driving advancements for the future.

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