Wei-Chen Chang

Title: Wei-Chen Chang: Semiconductor and Substrate-Polishing Inventor.

Introduction

Wei-Chen Chang is an inventor based in Nantou, Taiwan. His work includes semiconductor structures and substrate-polishing systems. He is associated with Taiwan Semiconductor Manufacturing Company Limited and holds 3 patents.

Latest Patents

Chang’s listed latest patents address semiconductor fabrication and polishing processes.

“Semiconductor Structure Including Bottom Isolation and Method for Manufacturing the Same” describes a structure with two fin portions and corresponding devices, separated by an isolation portion. A hard-mask portion beneath the isolation includes a main region and two sidewall regions. The regions use different materials to help separate the fins and devices.

“System and Method for Polishing Substrate” describes polishing a substrate while monitoring the polishing pad’s thickness. The system detects an eddy current generated by a conductor beneath the pad. If the pad becomes thinner than a predetermined value, the method calls for replacing it.

Career Highlights

Chang’s patent work reflects an emphasis on semiconductor device structures and manufacturing methods. His polishing-related invention also addresses process monitoring and pad replacement during substrate production.

Collaborations

Chang’s listed coworkers include Yi-Ching Chiou and Jiun-Yu Lai. His company affiliation connects his work with Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Wei-Chen Chang’s patents cover complementary aspects of semiconductor manufacturing, from device isolation structures to substrate polishing and process control.