Location History:
- Miyagi, JP (2019)
- Albany, NY (US) (2019 - 2022)
Company Filing History:
Years Active: 2019-2022
Title: Wanjae Park: Innovator in Plasma Treatment Technologies
Introduction
Wanjae Park is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of plasma treatment technologies, holding a total of 3 patents. His work focuses on enhancing surface adhesion for lithography processes, which is crucial in various applications within the semiconductor industry.
Latest Patents
Wanjae Park's latest patents include a plasma treatment method designed to enhance surface adhesion for lithography. This method involves providing an input substrate with an anti-reflective coating layer and an underlying layer. The process includes a surface adhesion modification step utilizing plasma treatment to increase the adhesion properties of the anti-reflective coating without affecting downstream processes. Additionally, he has developed a plasma processing method that processes a target object with stacked organic, mask, and resist films. This method modifies the resist film using plasma at low temperatures, ensuring precise patterning.
Career Highlights
Wanjae Park is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative approaches have contributed to advancements in lithography techniques, making him a valuable asset to his organization.
Collaborations
Wanjae has collaborated with esteemed colleagues such as Shuhei Ogawa and Yoshihide Kihara. Their combined expertise has fostered a productive environment for innovation and development in plasma treatment technologies.
Conclusion
Wanjae Park's contributions to plasma treatment methods and surface adhesion enhancement are noteworthy. His patents reflect a commitment to advancing technology in the semiconductor field, showcasing his role as a leading inventor in this domain.