Victor C Y Chang

Title: Victor C Y Chang: Innovator in Semiconductor Technology

Introduction

Victor C Y Chang is a prominent inventor based in Tucheng, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the modeling of parasitic capacitance and the characterization of metal sheet resistance in integrated circuits. With a total of 2 patents, his work has enhanced the accuracy of various processes in semiconductor manufacturing.

Latest Patents

Chang's latest patents include a "Process Related Deviation Corrected Parasitic Capacitance Modeling Method." This innovative method provides an experimental correlation within a parasitic capacitance model, allowing for the determination of parasitic capacitance with enhanced accuracy. The method utilizes actual dimensions and spacings of conductor layers, which are derived from nominal dimensions and process-related deviations.

Another notable patent is the "Methodology to Characterize Metal Sheet Resistance of Copper Damascene Process." This method focuses on determining parameters of damascene interconnects in integrated circuit devices. By extracting drawn dimensions and local pattern density, the method calculates a parameter that improves the accuracy of extracted damascene metal line resistance and parasitic capacitance.

Career Highlights

Victor C Y Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing semiconductor technologies. His innovative approaches have contributed to the company's reputation for excellence in manufacturing processes.

Collaborations

Chang has collaborated with notable colleagues such as Harry Chuang and Yung-Shun Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.

Conclusion

Victor C Y Chang's contributions to semiconductor technology through his patents and work at TSMC highlight his role as an influential inventor. His innovative methods continue to enhance the accuracy and efficiency of semiconductor manufacturing processes.