Tzu Ching Chang

Title: Innovations of Tzu Ching Chang

Introduction

Tzu Ching Chang is a prominent inventor based in Dali, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

Chang's latest patents include a method of fabricating semiconductor devices that feature different architectures. This method involves a dual-architecture-compatible design, which allows for the formation of transistor components in a transistor layer. The process includes fabricating additional components based on either a buried power rail (BPR) type of architecture or a non-buried power rail (non-BPR) type of architecture. The first step involves forming various non-dummy and dummy structures in corresponding sub-TR and supra-TR layers. His other patent details a method of forming a semiconductor device that includes creating an active area structure, gate structures, and contact-source/drain conductors, all of which are essential for the device's functionality.

Career Highlights

Tzu Ching Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a valuable asset in the field.

Collaborations

Chang has collaborated with notable colleagues, including Chung-Hui Chen and Chan-Hong Chern. These partnerships have further enhanced his research and development efforts in semiconductor technology.

Conclusion

Tzu Ching Chang's contributions to semiconductor innovations demonstrate his expertise and commitment to advancing technology. His patents reflect a deep understanding of complex manufacturing processes, making him a key figure in the industry.