Company Filing History:
Years Active: 2020-2025
Title: Innovations of Tung-Kai Chen
Introduction
Tung-Kai Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 9 patents. His work focuses on improving the manufacturing processes and materials used in semiconductor fabrication.
Latest Patents
Among his latest patents are methods for manufacturing a chemical-mechanical polishing (CMP) slurry and techniques for performing the CMP process on substrates with metal features. These innovations involve a balanced concentration ratio of chelator additives to inhibitor additives, which is determined based on the electro potential (Ev) value of the substrate's metal material. Additionally, he has developed a chemical mechanical polishing method that includes a unique planarization technique. This method involves polishing a substrate with varying degrees of hydrophobicity or hydrophilicity, ensuring that the contact angle difference during polishing remains minimal.
Career Highlights
Tung-Kai Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance his research and development efforts. His expertise in CMP processes has positioned him as a key figure in the semiconductor industry.
Collaborations
He collaborates with notable colleagues, including Kei-Wei Chen and Hui-Chi Huang, to further enhance the effectiveness of their innovations.
Conclusion
Tung-Kai Chen's contributions to the field of chemical mechanical polishing have significantly impacted semiconductor manufacturing. His innovative approaches and collaborative efforts continue to drive advancements in this critical area of technology.