The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

Jun. 14, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tung-Kai Chen, New Taipei, TW;

Shang-Yu Wang, Changhua County, TW;

Wan-Chun Pan, Hsinchu, TW;

Zink Wei, Hsinchu, TW;

Hui-Chi Huang, Zhubei, TW;

Kei-Wei Chen, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/12 (2006.01); B24B 37/12 (2012.01); B24B 37/20 (2012.01); B24B 53/017 (2012.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
B24B 49/12 (2013.01); B24B 37/12 (2013.01); B24B 37/20 (2013.01); B24B 53/017 (2013.01); G01N 21/6456 (2013.01);
Abstract

A method of operating a chemical mechanical planarization (CMP) tool includes attaching a polishing pad to a first surface of a platen of the CMP tool using a glue; removing the polishing pad from the platen, wherein after removing the polishing pad, residue portions of the glue remain on the first surface of the platen; identifying locations of the residue portions of the glue on the first surface of the platen using a fluorescent material; and removing the residue portions of the glue from the first surface of the platen.


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