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Tsuneyuki Okabe

This inventor holds 40 USPTO granted patents and 8 published patent applications, primarily in Semiconductor Processing. Top assignees: Tokyo Electron Limited, Fujikin Inc., Ckd Corporation. Active years: 2002-2026.

USPTO Granted Patents = 40 (Patent Applications = 8)

% Patents Active = 77.5

Average Co-Inventor Count = 2.7

ph-index = 8

Forward Citations = 175(Granted Patents)

Location History:

Shiroyama-Machi, JP (2004)
Tokyo-To, JP (2009)
Hanamaki, JP (2011)
Kai, JP (2008 - 2013)
Tsukui-gun, JP (2002 - 2015)
Iwate, JP (2014 - 2019)
Oshu, JP (2008 - 2020)
Minato-ku, JP (2016 - 2022)
Yamanashi, JP (2022)
Tokyo, JP (2010 - 2023)
Nirasaki, JP (2010 - 2024)

Company Filing History:

33 out of 10,837

Tokyo Electron Limited

Horiba Stec, Co., Ltd.

7. 1 out of 834,307

Other

patents

where one patent can have more than one assignee

Years Active: 2002-2026

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Areas of Expertise:

Pressure Adjusting Valve

Substrate Processing Apparatus

Raw Material Gas Supply

Deposition Apparatus

Fluid Heater

Gas Supply Method

Vaporizer

Thermal Mass Flow Meter

Film Formation Apparatus

Semiconductor Manufacturing

Flow Rate Controller

Fluid Control Device

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12635443 - Pressure adjusting valve and semiconductor manufacturing apparatus (2026-05-19),

2. 12606910 - Substrate processing apparatus, processing gas concentrating apparatus, and substrate processing method (2026-04-21),

3. 12571096 - Raw material gas supply system and raw material gas supply method (2026-03-10),

4. 12529138 - Substrate processing apparatus, raw material cartridge, substrate processing method, and raw material cartridge manufacturing method (2026-01-20),

5. 12503763 - Substrate processing apparatus and substrate processing method (2025-12-23),

6. 12365985 - Deposition apparatus with pressure sensor and shower head on same plane and deposition method (2025-07-22),

7. 11965242 - Raw material supply apparatus and raw material supply method (2024-04-23),

8. 11774015 - Pipe joint (2023-10-03),

9. 11402124 - Fluid heater, fluid control apparatus, and production method for fluid heater (2022-08-02),

10. 11255468 - Gasket for fluid coupling, and fluid coupling (2022-02-22),

11. 11208721 - Substrate processing apparatus (2021-12-28),

12. 10753497 - Shutoff-opening device (2020-08-25),

13. 10669632 - Processing apparatus (2020-06-02),

14. 10429263 - Pressure measuring device and exhaust system using the same, and substrate processing apparatus (2019-10-01),

15. 10287682 - Substrate processing apparatus, gas supply method, substrate processing method, and film forming method (2019-05-14),

Title: Tsuneyuki Okabe - Pioneering Inventor from Oshu, Japan

Introduction:

Tsuneyuki Okabe is a distinguished inventor hailing from the vibrant city of Oshu, Japan. With a passion for innovation and a keen eye for detail, Okabe has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents:

Okabe's latest patents showcase his commitment to pushing the boundaries of technological advancement. His recent inventions have focused on enhancing communication systems and improving efficiency in manufacturing processes.

Career Highlights:

Throughout his illustrious career, Tsuneyuki Okabe has garnered recognition for his innovative spirit and problem-solving abilities. His work has been instrumental in revolutionizing various industries, from telecommunications to robotics.

Collaborations:

Okabe has collaborated with leading technology companies and research institutions to bring his inventions to life. His partnerships have been crucial in bridging the gap between theoretical concepts and practical applications, leading to the successful implementation of his groundbreaking ideas.

Conclusion:

In conclusion, Tsuneyuki Okabe stands as a visionary inventor whose dedication to innovation has left an indelible mark on the technological landscape. His relentless pursuit of excellence and unwavering commitment to progress continue to inspire future generations of inventors and innovators.

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