The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2021

Filed:

Mar. 05, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kohei Fukushima, Oshu, JP;

Tsuneyuki Okabe, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); H01L 21/673 (2006.01); C23C 16/44 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45502 (2013.01); C23C 16/4409 (2013.01); C23C 16/4412 (2013.01); C23C 16/4584 (2013.01); C23C 16/45578 (2013.01); C23C 16/45589 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01); H01L 21/67309 (2013.01); H01L 21/68771 (2013.01);
Abstract

A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.


Find Patent Forward Citations

Loading…