The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Sep. 19, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Eiichi Komori, Nagoya, JP;
Tsuneyuki Okabe, Nagoya, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B01D 53/02 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); B01D 53/02 (2013.01); H01J 37/3244 (2013.01); H01J 37/32834 (2013.01); H01J 37/32844 (2013.01); B01D 2253/204 (2013.01); B01D 2257/60 (2013.01);
Abstract
A substrate processing apparatus includes a processing chamber configured to process a substrate, and a filtration part containing a porous coordination polymer and provided in an exhaust path configured to exhaust a gas from the processing chamber.