Tse-Wei Liu

Title: Innovations by Tse-Wei Liu: Pioneering Semiconductor Technologies

Introduction

Tse-Wei Liu, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technologies. With a total of five patents to his name, Liu's work primarily focuses on methods that enhance the performance and efficiency of semiconductor fabrication processes.

Latest Patents

Among Liu's latest innovations is a groundbreaking **Method of forming a silicon oxide layer**. This method involves the formation of a silicon oxide layer on a semiconductor wafer using a high temperature oxidation (HTO) process. The process employs dichlorosilane (SiHCl) and nitrous oxide (N2O) as reacting gases, which are utilized in a flow rate ratio greater than 2:1. The reacting moles of dichlorosilane to nitrous oxide are maintained in a proportion of 1:2, which plays a crucial role in the efficiency of the oxidation.

Another notable patent is his **Method of increasing selectivity in silicon nitride deposition**. This innovation enhances the selectivity of silicon nitride deposition by first forming a silicon oxide layer over a portion of the substrate. Ammonia (NH3) is then passed over the silicon oxide layer and the substrate for a specific duration to carry out a surface treatment. This is followed by the deposition of silicon nitride over the substrate and the silicon oxide layer, resulting in improved selectivity in the fabrication process.

Career Highlights

Tse-Wei Liu's professional journey includes significant roles at prominent companies in the semiconductor industry. He has worked for **United Microelectronics Corporation** and **United Silicon Incorporated**, where his expertise and innovative approach have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

Throughout his career, Liu has collaborated with esteemed colleagues, including Cheng-Chieh Huang and Tang Yu. These partnerships have enabled the development and refinement of various semiconductor technologies, further solidifying Liu's reputation as a leading inventor in his field.

Conclusion

Tse-Wei Liu's inventive contributions have had a considerable impact on semiconductor technology, particularly through his patented methods for silicon oxide layer formation and silicon nitride deposition. His work exemplifies the spirit of innovation, demonstrating how dedicated inventors can enhance industrial processes and capabilities. With each patent, Liu continues to pave the way for future advancements in the semiconductor industry.