The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Dec. 04, 1998
Applicant:
Inventors:
Li-Wu Tsao, Keelung, TW;
Tse-Wei Liu, Hsinchu, TW;
Cheng-Chieh Huang, Taipei Hsien, TW;
Tang Yu, Hsinchu Hsien, TW;
Eddie Chen, Hsinchu, TW;
Assignee:
United Silicon Incorporated, Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R / ; H01L / ;
U.S. Cl.
CPC ...
438 16 ; 438 14 ; 438 15 ;
Abstract
A method of water mark inspection. By forming a pattern on a test wafer, the water mark formed thereon directly reflects the features of a wafer product to be evaluated. The water mark is formed by simulating fabrication process conditions of forming the wafer product of which the performance is to be evaluated. Thus, after scanning the water mark by a defect inspection machine, the performance of the wafer product is evaluated.