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For the Inventor, By the Inventor

Tokyo, Japan

Toshiyuki Toyoshima

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 313(Granted Patents)


Location History:

  • Hyogo, JP (2004)
  • Chiyoda-ku, JP (2005)
  • Tokyo, JP (1999 - 2014)

Company Filing History:

goldMedal11 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents

Years Active: 1999-2014

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11 patents (USPTO):Explore Patents
1. 8674046 - Source material for preparing low dielectric constant material (2014-03-18),
2. 7100275 - Method of producing a multi-layered wiring board (2006-09-05),
3. 7030007 - Via-filling material and process for fabricating semiconductor integrated circuit using the material (2006-04-18),
4. 6924240 - Low dielectric constant material, insulating film comprising the low dielectric constant material, and semiconductor device (2005-08-02),
5. 6774314 - Electronic device and coupler (2004-08-10),
6. 6699748 - Method of fabricating capacitor having a photosensitive resin layer as a dielectric (2004-03-02),
7. 6579657 - Material for forming a fine pattern and method for manufacturing a semiconductor device using the same (2003-06-17),
8. 6568996 - Polishing agent for processing semiconductor, dispersant used therefor and process for preparing semiconductor device using above polishing agent for processing semiconductor (2003-05-27),
9. 6319853 - Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby (2001-11-20),
10. 6180320 - Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby (2001-01-30),
11. 5858620 - Semiconductor device and method for manufacturing the same (1999-01-12),

Title: Innovations by Toshiyuki Toyoshima: A Glimpse into His Contributions

Introduction

Toshiyuki Toyoshima, an esteemed inventor based in Tokyo, Japan, holds a remarkable portfolio of 11 patents. His contributions to the field of materials science and engineering have significantly impacted the development of innovative technologies in modern electronics.

Latest Patents

Among his latest patents, Toyoshima has developed a "Source Material for Preparing Low Dielectric Constant Material." This technology focuses on creating a low dielectric constant material with excellent water resistance, achieved through heat treatment of a borazine compound. Furthermore, he has patented a "Method of Producing a Multi-Layered Wiring Board," detailing a process that enhances wiring board production through precise methods of exposure and development treatment, resulting in advanced integrated circuits.

Career Highlights

Toyoshima currently works at Mitsubishi Electric Corporation, where he has been instrumental in pushing the boundaries of electrical engineering. His innovative approaches and dedication to research have positioned him as a key player in the advancement of electronic materials.

Collaborations

Throughout his career, Toyoshima has collaborated with talented colleagues, including Takeo Ishibashi and Naoki Yasuda. Together, they have driven projects that leverage their collective expertise to bring groundbreaking innovations to fruition.

Conclusion

Toshiyuki Toyoshima’s achievements reflect his commitment to innovation in the field of electrical engineering. With a growing number of patents and a focus on cutting-edge technologies, he continues to be a source of inspiration for future inventors and engineers. His work not only exemplifies individual creativity but also underscores the significance of collaboration in driving technological advancements.

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