The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6699748 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 02, 2004

Filed:

Nov. 26, 2002
Applicant:
Inventors:

Toshiyuki Toyoshima, Hyogo, JP;

Hirofumi Fujioka, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract

A method of fabricating a capacitor includes selectively forming a positive photosensitive resin layer on a first conductive layer; exposing the positive photosensitive resin layer, immersing the exposed positive photosensitive resin layer in a solution in which dielectric particles are dispersed and diffusing the dielectric particles into the positive photosensitive resin layer; forming an insulating resin layer covering side faces of the positive photosensitive resin layer; and forming a second conductive layer on the positive photosensitive resin layer. According to the method, a very reliable capacitor having excellent electrical characteristics, such as dielectric strength, can be cheaply and easily fabricated in a wiring layer.


Find Patent Forward Citations

Toyoshima, Toshiyuki. (2004). Method of fabricating capacitor having a photosensitive resin layer as a dielectric (U.S. Patent No. 6699748). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6699748

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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