This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Micron Technology Incorporated. Active years: 2019-2023.
Company Filing History:
Years Active: 2019-2023
Title: Innovations of Toshiyuki Maenosono
Introduction
Toshiyuki Maenosono is a prominent inventor based in Higashihiroshima, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods and apparatuses that enhance the efficiency and functionality of semiconductor devices.
Latest Patents
Maenosono's latest patents include a method of forming a semiconductor device and a photomask used therein. This method involves forming an insulating film over various regions of a semiconductor substrate and patterning a polyimide film using a specialized photomask. The photomask features multiple regions with different transmittance rates, which correspond to the regions of the semiconductor substrate. Another notable patent is for a method of forming vias using a silicon on insulator substrate. This patent describes an apparatus that includes a substrate with a circuit formed on one surface and an electrode that extends through the substrate.
Career Highlights
Toshiyuki Maenosono is currently employed at Micron Technology Incorporated, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.
Collaborations
Maenosono has collaborated with several talented individuals in his field, including Yuta Kikuchi and Manabu Ito. These collaborations have contributed to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Toshiyuki Maenosono's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor devices and their applications.