Nagoya, Japan

Toshiyuki Ikedo

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Chiryu, JP (2019)
  • Nagoya, JP (2018 - 2024)

Company Filing History:


Years Active: 2018-2024

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11 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Toshiyuki Ikedo

Introduction

Toshiyuki Ikedo is a prominent inventor based in Nagoya, Japan, known for his significant contributions to the field of plasma technology. With a total of 11 patents to his name, Ikedo has made remarkable advancements that enhance the efficiency and functionality of plasma processing machines.

Latest Patents

Among his latest inventions is the plasma processing machine, which features an innovative attachment mechanism. This mechanism allows for the easy attachment and detachment of the plasma head to the head moving device, facilitating maintenance and the exchange of different plasma heads. Another notable invention is the plasma exposure device, which includes a plasma head designed to generate a plasmarized gas. This device is equipped with a gas supply system that controls the flow rate of the gas, along with a pressure detector that monitors the gas pressure supplied to the plasma head. This technology enables the detection of issues such as head clogging, thereby improving the reliability of the plasma emitting device.

Career Highlights

Throughout his career, Toshiyuki Ikedo has worked with esteemed companies such as Fuji Corporation and Fuji Machine Mfg. Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and innovation.

Collaborations

Ikedo has collaborated with talented individuals in his field, including Takahiro Jindo and Akihiro Niwa. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Toshiyuki Ikedo's work in plasma technology exemplifies the spirit of innovation and dedication to advancing industrial processes. His patents reflect a commitment to improving efficiency and functionality in plasma applications, making him a notable figure in the field.

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