The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Nov. 24, 2016
Applicant:
Fuji Corporation, Chiryu, JP;
Inventors:
Takahiro Jindo, Anjo, JP;
Toshiyuki Ikedo, Nagoya, JP;
Assignee:
FUJI CORPORATION, Chiryu, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32055 (2013.01); H01J 37/3244 (2013.01); H01J 37/32834 (2013.01); H01J 37/32825 (2013.01);
Abstract
Plasma generating apparatus includes a pair of electrodes configured to generate plasma by discharge, a first supply path configured to supply processing gas along an outer periphery of each of the pair of electrodes, a second supply path configured to supply processing gas between the pair of electrodes, and a suction path configured to suck the processing gas supplied along an outer peripheral surface of each of the pair of electrodes via the first supply path.