The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Apr. 04, 2017
Applicant:

Fuji Corporation, Chiryu, JP;

Inventors:

Takahiro Jindo, Anjo, JP;

Toshiyuki Ikedo, Nagoya, JP;

Akihiro Niwa, Anjo, JP;

Assignee:

FUJI CORPORATION, Chiryu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G01M 3/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32825 (2013.01); G01M 3/26 (2013.01); H01J 37/3299 (2013.01); H01J 37/32449 (2013.01); H01J 2237/006 (2013.01); H01J 2237/24585 (2013.01);
Abstract

An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.


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