Location History:
- Yamanashi, JP (2004)
- Nirasaki, JP (2010)
- Miyagi, JP (2020 - 2023)
Company Filing History:
Years Active: 2004-2023
Title: Toshiya Tsukahara: Innovator in Plasma Processing Technology
Introduction
Toshiya Tsukahara is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His innovative designs and methods have advanced the capabilities of substrate processing apparatuses.
Latest Patents
Tsukahara's latest patents include a "Placing table, positioning method of edge ring and substrate processing apparatus." This invention features an edge ring that surrounds a substrate, equipped with a first recess portion at its lower section. The electrostatic chuck has a first placing surface for the substrate and a second for the edge ring, with an embedded electrode. Additionally, an annular member surrounds the electrostatic chuck, incorporating a second recess portion and an elastic member within the space defined by the first recess portion, the electrostatic chuck, and the second recess portion. Another significant patent is the "Plasma processing apparatus and plasma processing method," which includes a processing vessel, lower electrode, annular member, and both inner and outer upper electrodes. This apparatus is designed to enhance the processing of target substrates through advanced power supply configurations.
Career Highlights
Throughout his career, Tsukahara has worked with prominent companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Tsukahara has collaborated with talented individuals such as Daisuke Hayashi and Takaaki Nezu. These partnerships have fostered innovation and creativity in their respective projects.
Conclusion
Toshiya Tsukahara's contributions to plasma processing technology and his innovative patents reflect his expertise and dedication to advancing the field. His work continues to influence the industry and inspire future innovations.