The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Feb. 08, 2002
Takaaki Nezu, Nirasaki, JP;
Katsumi Horiguchi, Nirasaki, JP;
Daisuke Hayashi, Nirasaki, JP;
Toshiya Tsukahara, Nirasaki, JP;
Takaaki Nezu, Nirasaki, JP;
Katsumi Horiguchi, Nirasaki, JP;
Daisuke Hayashi, Nirasaki, JP;
Toshiya Tsukahara, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A focus ring for a plasma processing apparatus has an inner region, middle region, and outer region, disposed in this order from the inner side to surround a target substrate. On the side to be exposed to plasma, the surfaces of the inner region and outer region consist essentially of a dielectric, while the surface of the middle region consists essentially of a conductor. The middle region is arranged to shift the peak of plasma density to the outside of the peripheral edge of the target substrate. If there is no middle region, the peak of plasma density appears substantially directly above the peripheral edge of the target substrate.