Katsumi Horiguchi

Title: Innovations of Katsumi Horiguchi

Introduction

Katsumi Horiguchi is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Latest Patents

Horiguchi's latest patents include a capacitive coupling plasma processing apparatus. This apparatus features a process chamber designed to maintain a vacuum atmosphere, along with a process gas supply section that introduces a process gas into the chamber. Within the chamber, a first and second electrode are positioned opposite each other. An RF power supply is utilized to generate an RF electric field in the plasma generation region between the electrodes, effectively converting the process gas into plasma. The target substrate is supported by a member positioned between the electrodes, ensuring that its process target surface faces the second electrode. Additionally, a conductive functional surface is grounded and placed around the plasma generation region to enhance plasma expansion.

Another significant patent is the focus ring for semiconductor treatment and plasma treatment devices. This focus ring consists of an inner region, middle region, and outer region, arranged sequentially from the inner side to the outer side surrounding a target substrate. The surfaces of the inner and outer regions are primarily dielectric, while the middle region is conductive. This design shifts the peak plasma density outward from the peripheral edge of the target substrate, optimizing the plasma treatment process.

Career Highlights

Throughout his career, Horiguchi has worked with prominent companies such as Tokyo Electron Limited and Toshiba Corporation. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to innovative solutions in the semiconductor industry.

Collaborations

Horiguchi has collaborated with notable colleagues, including Takaaki Nezu and Kazuya Nagaseki. Their combined efforts have further advanced the field of plasma processing and semiconductor manufacturing.

Conclusion

Katsumi Horiguchi's contributions to plasma processing technology and his innovative patents have significantly impacted the semiconductor industry. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.