Kawasaki, Japan

Toshimoto Nakagawa

This inventor holds 9 USPTO granted patents. Top assignees: Nagase Co., Ltd., Hirama Laboratories Co., Ltd., Hirama Rika Kenkyujo Ltd.. Active years: 1993-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshimoto Nakagawa. Retrieved from https://idiyas.com/inventor/toshimoto-nakagawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 88.9

Average Co-Inventor Count = 5.3

ph-index = 5

Forward Citations = 52(Granted Patents)


Location History:

  • Kawasakishi, JP (1993 - 1997)
  • Kawasaki, JP (1999 - 2006)

Company Filing History:


Years Active: 1993-2006

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9 patents (USPTO):Explore Patents

Title: Inventor Toshimoto Nakagawa: Innovations in Water-based Resist Stripping Technologies

Introduction

Toshimoto Nakagawa, an accomplished inventor based in Kawasaki, Japan, has made significant contributions to the field of semiconductor processing. With a total of nine patents to his name, Nakagawa has focused primarily on innovations that enhance the efficiency and effectiveness of water-based resist stripping techniques. His work continues to influence the industry profoundly.

Latest Patents

Among Nakagawa's latest inventions are two notable patents: the "Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method" and the "Processing solution preparation and supply method and apparatus."

The water-based resist stripping liquid management apparatus is designed to optimize the performance of water-based resist stripping liquids. It includes an absorptiometer for measuring water concentration and an electrical conductivity meter for monitoring degraded component concentration. These devices work together within an adjusting bath to ensure that the resist stripping performance remains stable, thereby reducing liquid consumption and minimizing downtime.

Meanwhile, the processing solution preparation and supply apparatus is adept at preparing a processing solution for semiconductor substrates on-site. It involves a dissolving preparation bath that utilizes ultrapure water while maintaining low microorganism concentrations through constant circulation. This innovation not only enhances processing solution quality but also improves cost efficiency by reducing particle contamination.

Career Highlights

Toshimoto Nakagawa's professional journey includes working at renowned companies, including Nagase & Company, Ltd., where he honed his skills in semiconductor technologies. His focus on innovative water-based solutions has positioned him as a leading figure in the industry.

Collaborations

Throughout his career, Nakagawa has collaborated with esteemed colleagues such as Shu Ogawa and Makoto Kikukawa, contributing to various projects that push the boundaries of semiconductor processing technology. These partnerships have fostered an environment of creativity and innovation.

Conclusion

In conclusion, Toshimoto Nakagawa's contributions to the field of semiconductor processing through his innovative patents underscore his role as a pivotal inventor in water-based resist stripping technologies. With a keen eye for efficiency and sustainability, Nakagawa's work continues to impact the industry positively, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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