The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 1999

Filed:

Mar. 06, 1997
Applicant:
Inventors:

Toshimoto Nakagawa, Kawasaki, JP;

Kouzo Tsukada, Yokohama, JP;

Shu Ogawa, Nagareyama, JP;

Takahiro Houzan, Tatsuno, JP;

Yoshitaka Nishijima, Hyogo, JP;

Assignees:

Hirama Rika Kenkyujo Ltd., Kanagawa, JP;

Nagase & Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 / ; 134 / ; 134 953 ; 134 991 ;
Abstract

In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for stripping the resist completely from the board. An apparatus for controlling this resist stripping solution comprises a resist stripping solution discharge device for discharging the resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution by using an absorption photometer, a source solution and water replenishing device for replenishing the resist stripping source solution and pure water by detecting the liquid level of the resist stripping solution by a liquid level gauge, and a source solution and/or water replenishing device for replenishing at least one of the resist stripping source solution pure water by detecting the water concentration of the resist stripping solution by using an another absorption photometer. As a result, in an apparatus for controlling a resist stripping solution used in resist stripping in a semiconductor manufacturing process or a liquid crystal board manufacturing process, the quality of the resist stripping solution is controlled constantly, the solution consumption is saved, the operation down time is reduced, and the cost is lowered.


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