Location History:
- Tatsuno, JP (1999)
- Himeji, JP (2001)
Company Filing History:
1 out of 2 
1 out of 68 
1 out of 832,843 Years Active: 1999-2001
Title: Takahiro Houzan: Innovator in Surface Treatment and Semiconductor Solutions
Introduction
Takahiro Houzan is a notable inventor based in Himeji, Japan. He has made significant contributions to the fields of surface treatment and semiconductor manufacturing. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of various industrial processes.
Latest Patents
One of Houzan's latest patents is an "Apparatus for treating surface of boards." This innovative apparatus includes treating means for applying a treating solution and rinse liquid to boards placed on a treating table. It features solution collecting means for separating waste treating solution from waste rinse liquid. Additionally, it incorporates waste solution storing, concentrating detecting, and solution supplementing means to maintain the performance of the treating solution through recycling.
Another significant patent is the "Apparatus for controlling resist stripping solution." This apparatus is designed for use in semiconductor and liquid crystal board manufacturing processes. It includes a resist stripping solution discharge device that detects the dissolved resist concentration using an absorption photometer. The system also features a replenishing device for maintaining the quality of the resist stripping solution, ultimately saving solution consumption and reducing operational downtime.
Career Highlights
Throughout his career, Takahiro Houzan has worked with various companies, including Hirama Rika Kenkyujo Ltd. His expertise in developing innovative solutions has made a substantial impact on the industries he has been involved in.
Collaborations
Houzan has collaborated with notable coworkers such as Shu Ogawa and Toshimoto Nakagawa. Their combined efforts have contributed to advancements in their respective fields.
Conclusion
Takahiro Houzan's contributions to surface treatment and semiconductor manufacturing highlight his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to efficiency and sustainability in technology.