The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Jan. 15, 2003
Toshimoto Nakagawa, Kawasaki, JP;
Yuko Katagiri, Kawasaki, JP;
Shu Ogawa, Tokyo, JP;
Yasuyuki Kobayakawa, Tokyo, JP;
Makoto Kikukawa, Yokohama, JP;
Yutaka Saito, Tatsuno, JP;
Yoshitaka Nishijima, Tatsuno, JP;
Toshimoto Nakagawa, Kawasaki, JP;
Yuko Katagiri, Kawasaki, JP;
Shu Ogawa, Tokyo, JP;
Yasuyuki Kobayakawa, Tokyo, JP;
Makoto Kikukawa, Yokohama, JP;
Yutaka Saito, Tatsuno, JP;
Yoshitaka Nishijima, Tatsuno, JP;
Nagase & Co., Ltd., Osaka, JP;
Hirama Laboratories Co., Ltd., Kanagawa, JP;
Nagase CMS Technology Co., Ltd., Tokyo, JP;
Abstract
A processing solution preparation and supply apparatus includes a dissolving preparation bath to which a material powder and ultrapure water are supplied. This dissolving preparation bath is connected to a substrate processing apparatus via a pipe, and a processing solution prepared from the material powder on-site is supplied to the processing apparatus. To reduce an increase in the microorganism concentration in the ultrapure water, this ultrapure water is circulated substantially constantly. This suppresses deterioration and concentration fluctuations of a processing solution for use in processing of a semiconductor substrate, when this processing solution is supplied to the use side. This also reduces particles and improves the economical efficiency.