The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
Dec. 02, 1994
Toshimoto Nakagawa, Kawasakishi, JP;
Kouzo Tsukada, Yokohamashi, JP;
Shu Ogawa, Nagareyamashi, JP;
Yoshitaka Sato, Yokohamashi, JP;
Shinichiro Shiotsu, Hyogoken, JP;
Hirama RIKA Kenkyujo Ltd., Kawasakishi, JP;
Nagase & Co., Ltd., Osaka, JP;
Abstract
A resist stripping solution is used in the stripping of resist in a liquid crystal board manufacturing process or semiconductor manufacturing process. The apparatus for controlling the resist stripping solution comprises a resist stripping solution discharge device for discharging resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution using an absorption photometer, first replenishing device for replenishing organic solvent and alkanolamine such as MEA or the like by detecting the liquid level of the resist stripping solution using a liquid level gauge, and second replenishing device for replenishing at least one of organic solvent and alkanolamine such as MEA or the like by detecting the concentration of alkanolamine such as MEA or the like of the resist stripping solution by an absorption photometer. As a result, the quality of the resist stripping solution can always be constant, and the consumption volume of the solution, the operation down time and the cost can be notably reduced.