Toshimitsu Uehigashi

Title: Innovations of Toshimitsu Uehigashi

Introduction

Toshimitsu Uehigashi is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for forming various metal films. His work has led to the acquisition of two patents, showcasing his innovative approach to film formation technologies.

Latest Patents

Uehigashi's latest patents include a method for forming NiSi film, a method for forming silicide film, and a method for forming metal film for use in silicide-annealing. One of his key innovations involves a method for the formation of a silicide film, which includes forming an Ni film on a silicon substrate and subsequently heat-treating it to create an NiSi film. This process incorporates a preannealing treatment using hydrogen gas at a controlled temperature to eliminate impurities before the final heat treatment. Additionally, he has developed a method for forming an Ni film using a chemical vapor deposition (CVD) technique, which operates within a specific temperature range to ensure optimal film quality.

Career Highlights

Uehigashi is currently employed at Ulvac, Inc., a company known for its advanced vacuum technology and materials processing solutions. His work at Ulvac has allowed him to further explore and refine his innovative techniques in film formation.

Collaborations

Some of his notable coworkers include Yasushi Higuchi and Harunori Ushikawa, who have collaborated with him on various projects within the company.

Conclusion

Toshimitsu Uehigashi's contributions to the field of materials science through his innovative methods for film formation have established him as a prominent inventor. His patents reflect a commitment to advancing technology in this area, and his work continues to influence the industry.