Toshihiro Aida

Title: Innovations of Toshihiro Aida

Introduction

Toshihiro Aida is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of gas supply and substrate cleaning technologies. With a total of 3 patents, Aida's work reflects his commitment to advancing industrial processes.

Latest Patents

Aida's latest patents include a "Method and apparatus for supplying mixed gas." This invention focuses on supplying high-pressure mixed gas, which combines a low-vapor-pressure first gas and a high-vapor-pressure second gas. The design aims to minimize the amount of the first gas that is discarded during the process. The mixed gas is supplied from a mixing container to a designated use point, ensuring efficiency in gas utilization.

Another significant patent is the "Substrate cleaning apparatus and vacuum processing system." This apparatus features a supporting unit within a processing chamber, designed to support a substrate. It includes nozzle units that eject gas clusters to clean the substrate's peripheral area. The system allows for the adiabatic expansion of cleaning gas, which effectively removes unwanted substances.

Career Highlights

Throughout his career, Toshihiro Aida has worked with prominent companies such as Iwatani Corporation and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in gas supply and substrate cleaning technologies.

Collaborations

Aida has collaborated with notable coworkers, including Yu Yoshino and Takehiko Senoo. Their combined efforts have fostered innovation in their respective fields.

Conclusion

Toshihiro Aida's contributions to technology through his patents and collaborations highlight his role as a significant inventor in Japan. His work continues to influence advancements in gas supply and substrate cleaning systems.