The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Oct. 10, 2014
Iwatani Corporation, Osaka, JP;
Central Glass Company, Limited, Yamaguchi, JP;
Kunihiko Koike, Shiga, JP;
Yu Yoshino, Shiga, JP;
Naohisa Makihira, Tokyo, JP;
Takehiko Senoo, Osaka, JP;
Toshihiro Aida, Tokyo, JP;
Tomoya Biro, Tokyo, JP;
Hiroshi Ichimaru, Yamaguchi, JP;
Masahiro Tainaka, Yamaguchi, JP;
IWATANI CORPORATION, Osaka, JP;
CENTRAL GLASS COMPANY, LIMITED, Yamaguchi, JP;
Abstract
A method and apparatus, for supplying high-pressure mixed gas of a low-vapor-pressure first gas as an active gas and a high-vapor-pressure second gas, are arranged to reduce an amount of the first gas discarded. The mixed gas in a high-pressure state is supplied from a mixing container to a use point. Upon reduction of pressure in the mixing container to a setpoint as a result of supply to the use point, a predetermined amount of the first gas is charged into a replenishment container connected to the mixing container by a replenishment line having a replenishment valve, and which is evacuated. As the second gas is charged into the replenishment container charged with the first gas, the replenishment valve is opened such that the first gas in the replenishment container is forced out by the second gas, thereby charging the mixing container with the mixed gas in the high-pressure condition.