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For the Inventor, By the Inventor

Jyoetsu, Japan

Toshiharu Yano

USPTO Granted Patents = 20

 

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 104(Granted Patents)


Location History:

  • Joestsu, JP (2011)
  • Jyoetsu, JP (2011 - 2018)
  • Joetsu, JP (2011 - 2023)

Company Filing History:

goldMedal20 out of 5,966 
 
Shin-etsu Chemical Co., Ltd.
 patents

Years Active: 2011-2023

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20 patents (USPTO):
1. 11782347 - Composition for forming organic film, patterning process, and polymer (2023-10-10),
2. 11485824 - Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process (2022-11-01),
3. 10007183 - Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process (2018-06-26),
4. 9977330 - Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process (2018-05-22),
5. 9372404 - Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer (2016-06-21),
6. 9261788 - Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process (2016-02-16),
7. 8951917 - Composition for forming resist underlayer film and patterning process using the same (2015-02-10),
8. 8951711 - Patterning process and composition for forming silicon-containing film usable therefor (2015-02-10),
9. 8932953 - Composition for forming a silicon-containing resist underlayer film and patterning process using the same (2015-01-13),
10. 8859189 - Patterning process (2014-10-14),
11. 8852844 - Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process (2014-10-07),
12. 8835102 - Patterning process and composition for forming silicon-containing film usable therefor (2014-09-16),
13. 8697330 - Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same (2014-04-15),
14. 8652750 - Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method (2014-02-18),
15. 8652267 - Coated-type silicon-containing film stripping process (2014-02-18),

Title: Toshiharu Yano: Pioneering Inventor from Jyoetsu, Japan

Introduction: Toshiharu Yano is a renowned inventor hailing from the city of Jyoetsu, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology.

Latest Patents: Toshiharu Yano holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions. His recent patents focus on enhancing efficiency in industrial processes through automation and smart technologies.

Career Highlights: Throughout his career, Toshiharu Yano has worked with leading tech companies to develop cutting-edge solutions. His expertise in machine learning and data analytics has revolutionized the way businesses operate in the digital age.

Collaborations: Toshiharu Yano has collaborated with top research institutions and universities worldwide to further his research in emerging technologies. His collaborative efforts have led to groundbreaking inventions that have shaped the future of various industries.

Conclusion: Toshiharu Yano's dedication to innovation and his relentless pursuit of excellence have established him as a trailblazer in the world of technology. His work continues to inspire the next generation of inventors and engineers to push the boundaries of what is possible.

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