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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9977330 B1

PDFFull Text
Date of Patent:
May. 22, 2018

Filed:

Sep. 16, 2015

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Seiichiro Tachibana, Jyoetsu, JP;

Daisuke Kori, Jyoetsu, JP;

Tsutomu Ogihara, Jyoetsu, JP;

Takeru Watanabe, Jyoetsu, JP;

Kazumi Noda, Jyoetsu, JP;

Toshiharu Yano, Jyoetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08F 216/10 (2006.01); C08G 61/12 (2006.01); C09D 129/02 (2006.01); C09D 165/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01); H01L 21/308 (2006.01); C07C 43/23 (2006.01); G03F 7/075 (2006.01); C07C 39/17 (2006.01); C08K 5/13 (2006.01); C09D 7/12 (2006.01); H01L 21/02 (2006.01); H01L 27/12 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); C07C 39/17 (2013.01); C07C 43/23 (2013.01); C08F 216/10 (2013.01); C08G 61/12 (2013.01); C08K 5/13 (2013.01); C09D 7/1233 (2013.01); C09D 129/02 (2013.01); C09D 165/00 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/0271 (2013.01); H01L 21/0276 (2013.01); H01L 21/02118 (2013.01); H01L 21/02164 (2013.01); H01L 21/02271 (2013.01); H01L 21/02318 (2013.01); H01L 21/308 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31138 (2013.01); C07C 2603/18 (2017.05); H01L 21/0274 (2013.01); H01L 21/31144 (2013.01); H01L 27/1203 (2013.01);
Abstract

The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2), wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; Rrepresents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and Lrepresents a divalent organic group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

Find Patent Forward Citations

Tachibana, Seiichiro. (2018). Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process (U.S. Patent No. 9977330). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9977330

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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