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For the Inventor, By the Inventor

Fukaya, Japan

Toshiharu Nakashima

This inventor holds 9 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 1996-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiharu Nakashima. Retrieved from https://idiyas.com/inventor/toshiharu-nakashima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9

% Patents Active = 55.6

Average Co-Inventor Count = 1.5

ph-index = 5

Forward Citations = 212(Granted Patents)


Location History:

  • Kawasaki, JP (1996 - 2001)
  • Tokyo, JP (2001 - 2004)
  • Fukaya, JP (2006)

Company Filing History:

goldMedal9 out of 8,995 
 
Nikon Corporation
 patents

Years Active: 1996-2026

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9 patents (USPTO):Explore Patents
1. 12585195 - Pattern exposure apparatus, device manufacturing method, and exposure apparatus (2026-03-24),
2. 7102731 - Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method (2006-09-05),
3. 7088426 - Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method (2006-08-08),
4. 6710846 - Environmental control apparatus for exposure apparatus (2004-03-23),
5. 6281965 - Exposure method and exposure system using the exposure method (2001-08-28),
6. RE37309 - Scanning exposure apparatus (2001-08-07),
7. 6208406 - Environmental control apparatus for exposure apparatus (2001-03-27),
8. 5976738 - Exposure and alignment method (1999-11-02),
9. 5534970 - Scanning exposure apparatus (1996-07-09),

Title: **Innovator Toshiharu Nakashima: Advancements in Projection Optical Systems**

Introduction

Toshiharu Nakashima, an esteemed inventor from Fukaya, Japan, has made significant contributions to the field of optical engineering. With a total of eight patents to his name, he has become a key figure in the development of methods and technologies related to projection optical systems.

Latest Patents

Nakashima's latest patents encompass a variety of innovative methods, including the projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, and exposure apparatus. His work focuses on measuring wavefront aberrations in projection optical systems and utilizing these measurements to improve the transfer of patterns onto wafers. By analyzing the line width differences of images of line patterns at different orientations, Nakashima’s methods allow for precise adjustments to the projection system, enhancing the accuracy of optical transfers.

Career Highlights

Nakashima's career has been primarily associated with Nikon Corporation, a leader in imaging and optical technologies. Throughout his tenure, he has continuously strived to advance the capabilities of optical systems, contributing to the development of high-precision manufacturing processes pivotal in semiconductor production.

Collaborations

Throughout his career, Nakashima has collaborated closely with other skilled professionals, including Masato Hamatani and Ken Ozawa. These partnerships have fostered a rich environment for innovation, allowing for the cross-pollination of ideas essential for tackling complex challenges in the field of optics.

Conclusion

Toshiharu Nakashima's work in the realm of projection optical systems demonstrates the critical intersection of innovation and technology. His patents not only reflect his ingenuity but also underline the importance of precision in the manufacturing processes of the future, making substantial contributions to the advancements in optical engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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