Exposure and alignment method

Abstract

An exposure method comprises a first exposure step of using a first exposure apparatus having a first exposure field and projecting a pattern of a first mask onto a photosensitive substrate to effect exposures according to a first shot map where an exposure region on the photosensitive substrate is divided in units of first shot areas each corresponding to the first exposure field; and a second exposure step of using a second exposure apparatus having a second exposure field larger than the first exposure field and projecting a pattern of a second mask onto the photosensitive substrate to effect exposures according to a second shot map arranged so that a number of shots therein becomes minimum when a region including the first shot map is divided in units of second shot areas each corresponding to the second exposure field. Also, an apparatus having a first exposure field, a second exposure apparatus having a second exposure field larger than the first exposure field, a first shot map forming device provided in the first exposure apparatus, a control unit for transferring information on the first shot map to the second exposure apparatus, and a second shot map forming device provided in the second exposure apparatus, for forming a second shot map, based on the information on the first shot map, so that a number of shots becomes minimum.