The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Jul. 21, 1999
Toshiharu Nakashima, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure system comprises a first exposure apparatus having a first exposure field and a second exposure apparatus having a second exposure field larger than the first exposure field. A first shot map forming device is provided in the first exposure apparatus to form a first shot map by dividing an exposure region on a photosensitive substrate in units of first shot areas each corresponding to the first exposure field. A control unit transfers information on the first shot map to the second exposure apparatus. A second shot map forming device is provided in the second exposure apparatus to form a second shot map, based on the information on the first shot map, so that a number of shots becomes minimum when an exposure region including the first shot map on the photosensitive substrate is divided in units of second shot areas each corresponding to the second exposure field. A manufacturing method provides apparatus used in the exposure system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile