The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Dec. 27, 2023
Nikon Corporation, Tokyo, JP;
Masaki Kato, Yokohama, JP;
Yasushi Mizuno, Saitama, JP;
Toshiharu Nakashima, Fukaya, JP;
Satoshi Kawado, Tokyo, JP;
NIKON Corporation, Tokyo, JP;
Abstract
A pattern-exposure-apparatus includes: spatial-light-modulating-element including a plurality of micro-mirrors selectively driven based on drawing data, illumination-unit that irradiates spatial-light-modulating-element with illumination-light at predetermined-incidence-angle, and projection-unit that projects reflected-light from selected micro-mirrors of spatial-light-modulating-element in ON-state to substrate, and pattern-exposure-apparatus projects and exposes pattern corresponding to drawing data to substrate, illumination-unit including condensing-optical-member that condenses light from surface-light-source having predetermined shape so as to obliquely irradiate light to spatial-light-modulating-element and that is disposed along optical-axis which is inclined at incidence-angle with respect to optical-axis of projection-unit so as to optically conjugate surface-light-source with pupil of projection-unit, and correcting-optical-member that deforms shape of outline of the surface-light-source so as to correct distortion of outline of image of the surface-light-source, which is formed on pupil of the projection-unit by reflected-light from micro-mirrors of the spatial-light-modulating-element in ON-state, into elliptical-shape according to incidence-angle.