Tony DiBiase

Title: Tony DiBiase: Innovator in Lithography Technology

Introduction

Tony DiBiase is a prominent inventor based in San Jose, CA (US). He holds a total of 8 patents that showcase his contributions to the field of lithography technology. His innovative approaches have significantly impacted the efficiency and accuracy of lithographic processes.

Latest Patents

One of Tony's latest patents is titled "Assessing critical dimension and overlay tolerance." This method involves constructing an error map for a lithography process by utilizing spatial error data compiled from both the lithography tool and the mask used in the process. By combining these error maps, an overall error map is produced, allowing for the identification and correction of excessive errors before committing products to the process. This innovation includes the use of lens error data and stage movement error data to enhance accuracy. Another notable patent is the "Process condition measuring device," which features a substrate with multiple sensors that measure parameters during substrate processing. This instrument is designed to mimic the properties of production substrates, ensuring that measurements are relevant and applicable to real-world scenarios.

Career Highlights

Tony has worked with notable companies such as KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in lithography technology.

Collaborations

Throughout his career, Tony has collaborated with talented individuals, including Mei H. Sun and Mark Wiltse. These partnerships have fostered innovation and the development of cutting-edge technologies in the field.

Conclusion

Tony DiBiase's work in lithography technology exemplifies the spirit of innovation. His patents and career achievements reflect his dedication to improving processes and outcomes in the industry. His contributions continue to influence the field and inspire future advancements.