Kai, Japan

Tomoyuki Sakoda

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2009-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoyuki Sakoda. Retrieved from https://idiyas.com/inventor/tomoyuki-sakoda-qfa2kkda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Nirasaki, JP (2009)
  • Kai, JP (2010)

Company Filing History:


Years Active: 2009-2010

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2 patents (USPTO):Explore Patents

Title: **Innovations by Tomoyuki Sakoda in Semiconductor Manufacturing**

Introduction

Tomoyuki Sakoda, a skilled inventor located in Kai, Japan, has made significant contributions to the field of semiconductor manufacturing. He holds two patents that reflect his innovative approaches and methodologies in integrating metal-containing films into semiconductor devices. His work primarily involves enhancing the efficiency and functionality of semiconductor components.

Latest Patents

Sakoda's most recent patents include:

1. **Method of integrating metal-containing films into semiconductor devices** - This method focuses on integrating a metal-containing film, such as tungsten, into a semiconductor device using a process which involves depositing the film on a substrate and heat treating it to optimize performance. Specific examples of the types of films described include tungsten (W), tungsten nitride (WN), tungsten silicide (WSi), and tungsten carbide (WC). The method also outlines the deposition of other metal-containing films utilizing corresponding metal carbonyl precursors, which broadens the potential applications in the semiconductor industry.

2. **Method for manufacturing semiconductor device and computer storage medium** - This innovation details the fabrication process of a semiconductor device that includes forming a PbTiOx film with a distinct orientation on a lower electrode, followed by a PZT film formation. The meticulous control over the environment during these processes aims to achieve optimal performance characteristics for semiconductor applications.

Career Highlights

Tomoyuki Sakoda currently works with Tokyo Electron Limited, a prominent company known for its cutting-edge technology in the semiconductor sector. His expertise in the integration of film materials into semiconductor devices has positioned him as a key figure within the industry, contributing to advancements that allow for improved device performance.

Collaborations

Sakoda's innovative work is often supported by collaborations with colleagues such as Shigeo Ashigaki and Hideaki Yamasaki. Their teamwork is essential in advancing the methodologies and technologies that are critical to modern semiconductor manufacturing.

Conclusion

With his two pivotal patents, Tomoyuki Sakoda exemplifies the innovative spirit that drives progress in semiconductor technology. His contributions not only enhance the functionality of electronic devices but also pave the way for future advancements in the field. As technology continues to evolve, the implications of Sakoda's inventions will likely play a significant role in the next generation of semiconductor solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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