Shizuoka-ken, Japan

Tomoo Kato



Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Shizuoka-ken, JP (2010 - 2015)
  • Shizuoka, JP (2015)
  • Haibara-gun, JP (2017)

Company Filing History:


Years Active: 2010-2017

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5 patents (USPTO):

Title: Tomoo Kato: Innovator in Semiconductor Cleaning Technologies

Introduction

Tomoo Kato is a prominent inventor based in Shizuoka-ken, Japan. He has made significant contributions to the field of semiconductor technology, particularly in cleaning compositions and processes. With a total of 5 patents to his name, Kato's work has had a substantial impact on the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Kato's latest patents include innovative solutions for cleaning semiconductor devices. One notable patent describes a cleaning composition designed to remove plasma etching and ashing residues from semiconductor substrates. This composition includes water, a hydroxylamine or its salt, a basic organic compound, and an organic acid, maintaining a pH of 7 to 9. Another significant patent focuses on a polishing liquid for metals, specifically for polishing conductor films like copper or copper alloys. This liquid comprises colloidal silica particles, a metal anticorrosive agent, surfactants or water-soluble polymers, an oxidizing agent, and an organic acid, enhancing the polishing process in semiconductor device production.

Career Highlights

Tomoo Kato is currently associated with Fujifilm Corporation, where he continues to develop cutting-edge technologies in the semiconductor field. His expertise in cleaning and polishing processes has positioned him as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Kato has collaborated with notable colleagues, including Atsushi Mizutani and Tadashi Inaba. Their combined efforts have contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

Tomoo Kato's contributions to semiconductor cleaning technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and provide effective solutions to enhance production processes.

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