Tokyo, Japan

Tomohiro Nakamichi

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 4.7

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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5 patents (USPTO):Explore Patents

Title: **The Innovations of Tomohiro Nakamichi: Pioneering Aberration Measurement Techniques**

Introduction

Tomohiro Nakamichi is an accomplished inventor based in Tokyo, Japan, known for his significant contributions to the field of electron microscopy. With a total of four patents, Nakamichi has developed advanced methods aimed at enhancing the precision and efficiency of measuring aberrations in electron microscopes. His work has broad implications for both research and industry, particularly in fields that rely on detailed imaging at the micro and nano scale.

Latest Patents

Tomohiro Nakamichi's latest patents demonstrate his innovative approach to solving complex problems in electron microscopy. One of his primary inventions is titled **"Estimation Model Generation Method and Electron Microscope."** This patent introduces an aberration value estimator that employs a learned estimation model for predicting aberration values derived from Ronchigrams. In his method, a machine learning subsystem conducts extensive simulations by varying simulation conditions to generate a diverse array of Ronchigrams. This large dataset facilitates the creation of a highly effective learned estimation model through machine learning techniques.

Another notable patent is the **"Method of Measuring Aberration and Electron Microscope."** This method details a process for measuring aberration in electron microscopes by acquiring an image specifically designed for aberration measurement and utilizing that image for precise measurement. Importantly, the process involves specifying the direction of defocusing based on a residual aberration uniquely determined by the optical system's configuration and conditions.

Career Highlights

Tomohiro Nakamichi works with JEOL Ltd., a renowned company known for its advanced electron microscopy technologies. His work there has positioned him as a leader in innovation, with a focus on addressing the challenges faced in high-resolution imaging. Through his persistent dedication and inventive spirit, Nakamichi has established himself within the scientific community and has contributed significantly to the advancement of imaging technologies.

Collaborations

Nakamichi's success is bolstered by collaborations with notable colleagues, including Shigeyuki Morishita and Ryusuke Sagawa. Together, they have shared insights and expertise that have contributed to their groundbreaking research and innovations in the field of electron microscopy.

Conclusion

In conclusion, Tomohiro Nakamichi stands out as a prominent inventor in the realm of electron microscopy. His latest patents reflect a deep understanding of the intricacies involved in aberration measurement and the utilization of machine learning for improved outcomes. Through his work at JEOL Ltd. and his collaborations with esteemed colleagues, Nakamichi continues to push the boundaries of innovation, shaping the future of microscopy technologies.

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