The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Jul. 20, 2022
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Keito Aibara, Tokyo, JP;

Tomohiro Nakamichi, Tokyo, JP;

Shigeyuki Morishita, Tokyo, JP;

Motofumi Saito, Tokyo, JP;

Ryusuke Sagawa, Tokyo, JP;

Fuminori Uematsu, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2804 (2013.01);
Abstract

Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.


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