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Jeol Ltd.

USPTO Granted Patents = 830

% Expired Patents = 14.3

EPO Patents = 255

Trademarks = 14

Forward Citations = 3,911

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687 inventors (with patents filed for the assignee):

Yuji Kohno (19 out of 19 patents)

Hidetaka Sawada (19 out of 19 patents)

Katsushige Tsuno (18 out of 20 patents)

4. Michio Okamura (17 out of 31 patents)

5. Takaya Satoh (15 out of 16 patents)

6. Fumio Hosokawa (15 out of 15 patents)

7. Shinichi Kitamura (14 out of 21 patents)

8. Yuki Endo (14 out of 39 patents)

9. Shigeyuki Morishita (14 out of 14 patents)

10. Toshikatsu Kaneyama (13 out of 13 patents)

11. Tsutomu Negishi (12 out of 19 patents)

12. Morio Ishihara (12 out of 18 patents)

13. Ayumi Kubo (11 out of 11 patents)

14. Shigenori Tsuji (11 out of 11 patents)

15. Masaaki Ubukata (10 out of 10 patents)

Core Competencies:

Electron Microscope

Charged Particle Beam

Mass Spectrometry

Image Acquisition

Specimen Processing

Nuclear Magnetic Resonance

Aberration Correction

Sample Milling

Automated Analyzer

Ion Beam Processing

Three-Dimensional Printing

Magnetic Field Correction

830 patents: Sort by Forward Citations

1. 12736489 - NMR measurement apparatus, and method of identifying solvent (2026-09-15),

2. 12704816 - Physical package for optical lattice clock (2026-08-11),

3. 12704472 - Modification of air/fluid flow around nuclear magnetic resonance probe and methods of use (2026-08-11),

4. D1135985 - Electron microscope (2026-07-21),

5. 12688611 - Electron microscope and calibration method (2026-07-21),

6. 12687599 - NMR measurement apparatus (2026-07-21),

7. 12678862 - Additive manufacturing development method and three-dimensional additive manufacturing system (2026-07-14),

8. 12665158 - Charged particle beam source and charged particle beam system (2026-06-23),

9. 12663404 - Polymer analysis apparatus and method (2026-06-23),

10. D1129525 - Electron microscope (2026-06-09),

11. 12640339 - Electron microscope, aberration correction method, and imaging method (2026-05-26),

12. 12633491 - Method of adjusting charged particle optical system and charged particle beam apparatus (2026-05-19),

13. 12631581 - Spectrum analysis apparatus and database creation method (2026-05-19),

14. 12631578 - Analyzing method and analyzer (2026-05-19),

15. 12630505 - Alkyne compound, vitamin D compound, analytical method, and production method (2026-05-19),

Jeol Ltd., headquartered in Tokyo, Japan, is a leading innovator in the field of electron microscopy and analytical instruments. The company specializes in the development and manufacturing of advanced electron microscopes, charged particle beam systems, and mass spectrometry solutions. Jeol's expertise extends to image acquisition, specimen processing, and nuclear magnetic resonance technologies, making it a key player in various scientific and industrial applications. Their commitment to precision and innovation supports research across multiple disciplines, enhancing the capabilities of scientists and engineers worldwide.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

830 Patents

#127 in Tokyo

#259 in Japan

#1,213 in the World

Jeol Ltd.

Forward Citations = 3,911

687 inventors:

Yuji Kohno (19 out of 19 patents)

Hidetaka Sawada (19 out of 19 patents)

Katsushige Tsuno (18 out of 20 patents)

4. Michio Okamura (17 out of 31 patents)

5. Takaya Satoh (15 out of 16 patents)

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