The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Mar. 01, 2019
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Shigeyuki Morishita, Tokyo, JP;

Takeo Sasaki, Tokyo, JP;

Tomohiro Nakamichi, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/153 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/222 (2013.01); H01J 37/265 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/221 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/282 (2013.01);
Abstract

An electron microscope includes: an optical system including an aberration correction device; and a control unit that controls the aberration correction device, wherein the control unit performs: processing for displaying, on a display unit, an image for designating a direction of aberration in superposition on an aberration pattern representing a state of aberration, processing for specifying the direction of aberration from the image that has been subjected to a rotation operation, and processing for controlling the aberration correction device to cause the aberration correction device to introduce an aberration in the specified direction.


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