The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Jan. 14, 2022
Applicant:
Jeol Ltd., Tokyo, JP;
Inventors:
Shigeyuki Morishita, Tokyo, JP;
Ryusuke Sagawa, Tokyo, JP;
Fuminori Uematsu, Tokyo, JP;
Tomohiro Nakamichi, Tokyo, JP;
Keito Aibara, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/10 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/10 (2013.01); H01J 37/26 (2013.01); H01J 2237/1534 (2013.01);
Abstract
A method of measuring an aberration in an electron microscope includes: acquiring an image for measuring the aberration in the electron microscope; and measuring the aberration by using the image. In measuring the aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system of the electron microscope and an optical condition of the optical system.