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For the Inventor, By the Inventor

Koshi, Japan

Tomohiro Iseki

This inventor holds 24 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Processing. Top assignee: Tokyo Electron Limited. Active years: 2009-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Iseki. Retrieved from https://idiyas.com/inventor/tomohiro-iseki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 75.0

Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 44(Granted Patents)


Location History:

  • Koshi-machi, JP (2009)
  • Hsin-Chu, TW (2012 - 2015)
  • Kumamoto, JP (2009 - 2020)
  • Koshi, JP (2010 - 2021)

Company Filing History:

goldMedal24 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2009-2021

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Areas of Expertise:
Coating Treatment
Semiconductor Device
Substrate Processing
Photo-lithographic Processing
Light Irradiation
Bubble Removing
Hardening Processing
Resist Coating
Storage Medium
Developing Apparatus
Computer-readable Medium
Degassing Apparatus
24 patents (USPTO):Explore Patents
1. 10901320 - Developing method, developing apparatus, and computer-readable recording medium (2021-01-26),
2. 10606177 - Substrate processing apparatus, substrate processing method, and storage medium (2020-03-31),
3. 10211050 - Method for photo-lithographic processing in semiconductor device manufacturing (2019-02-19),
4. 10120286 - Developing method, developing apparatus, and computer-readable recording medium (2018-11-06),
5. 9952512 - Developing method, developing apparatus, and computer-readable storage medium (2018-04-24),
6. 9899243 - Light irradiation apparatus (2018-02-20),
7. 9690202 - Developing method, developing apparatus and storage medium (2017-06-27),
8. 9649577 - Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording medium (2017-05-16),
9. 9627232 - Substrate processing method, substrate processing apparatus and non-transitory storage medium (2017-04-18),
10. 8956694 - Developing apparatus, developing method and storage medium (2015-02-17),
11. 8851011 - Coating treatment method, coating treatment apparatus, and computer-readable storage medium (2014-10-07),
12. 8697187 - Coating treatment method and coating treatment apparatus (2014-04-15),
13. 8505479 - Resist coating apparatus (2013-08-13),
14. 8496991 - Coating treatment method (2013-07-30),
15. 8414972 - Coating treatment method, coating treatment apparatus, and computer-readable storage medium (2013-04-09),

Title: Innovations in Substrate Processing by Tomohiro Iseki

Introduction

Tomohiro Iseki, an innovative inventor based in Koshi, Japan, holds an impressive 24 patents in the field of substrate processing technologies. His work primarily focuses on enhancing the methods and apparatus used in developing resist patterns on substrates, contributing significantly to advancements in the semiconductor industry.

Latest Patents

Iseki's latest inventions include a method and apparatus for developing exposed resist films, as well as a substrate processing apparatus. The method involves rotating the substrate while supplying a developing solution, ensuring that the resist film is evenly coated. Furthermore, the substrate processing apparatus is designed to efficiently depressurize the process container to a pressure of 1 Pa or lower, followed by the application of vacuum ultraviolet light, optimizing the substrate processing procedure.

Career Highlights

Iseki is currently associated with Tokyo Electron Limited, a renowned company in the field of semiconductor manufacturing. His dedication to research and development has solidified his reputation as a leading inventor in substrate processing technologies.

Collaborations

Tomohiro collaborates with skilled professionals such as Kousuke Yoshihara and Hirofumi Takeguchi, contributing to a robust team that pushes the boundaries of innovation within the industry. Together, they drive advancements that enhance efficiency and effectiveness in substrates processing.

Conclusion

Through his groundbreaking patents and collaborative efforts, Tomohiro Iseki is making significant strides in substrate processing technology. His work with Tokyo Electron Limited is vital in continuing to foster innovation in the semiconductor sector, ultimately shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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