Annaka, Japan

Tohru Ishizuka

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Nishishirakawa-gun, JP (2002)
  • Gunma, JP (2010)
  • Annaka, JP (2011 - 2014)
  • Takasaki, JP (2015)

Company Filing History:


Years Active: 2002-2015

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10 patents (USPTO):Explore Patents

Title: Tohru Ishizuka: Pioneering Innovations in Wafer Technology

Introduction

Tohru Ishizuka, an accomplished inventor based in Annaka, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of ten patents to his name, Ishizuka's innovations focus on advancing the manufacturing processes of bonded wafers and silicon epitaxial wafers.

Latest Patents

Ishizuka's recent patents include a groundbreaking method for manufacturing a bonded wafer. This invention leverages plasma activation treatment on the bonded surfaces of the bond wafer and base wafer prior to bonding. A key aspect of this method is that it minimizes the attachment of particles on the wafer's back surface during treatment, thereby enhancing cleanliness and efficiency.

In addition to this, he has also developed a silicon epitaxial wafer that features a silicon epitaxial layer grown via vapor phase epitaxy on a single crystal substrate. This layer is characterized by low surface irregularities, even when a high dopant concentration is present, ensuring superior quality in semiconductor production. His work on bonded SOI (Silicon On Insulator) wafers further underscores his expertise in the field.

Career Highlights

Ishizuka is currently affiliated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor materials industry. His innovative spirit and technical acumen have propelled advancements in wafer technology, earning him recognition within the industry.

Collaborations

Throughout his career, Ishizuka has collaborated with prominent colleagues such as Nobuhiko Noto and Norihiro Kobayashi. These partnerships have been instrumental in driving forward research and development efforts, contributing to the continuous improvement of semiconductor manufacturing processes.

Conclusion

Tohru Ishizuka exemplifies the essence of innovation in the semiconductor industry. Through his patents and collaborative efforts, he has significantly advanced wafer technology, paving the way for enhanced efficiency and quality in semiconductor manufacturing. His dedicated work at Shin-Etsu Handotai Co., Ltd. reflects the importance of innovation and collaboration in achieving groundbreaking advancements in technology.

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