Ting-Siang Su is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is titled "Semiconductor device having source/drain with a protrusion." This invention includes a source/drain (S/D) in a substrate adjacent to a gate structure. The S/D features a protrusion extending from its top surface, which has a tapered profile. Additionally, the device incorporates a contact plug that is electrically connected to the protrusion. Another notable patent is "Metal gate and manufacturing method thereof." This patent describes a semiconductor structure that includes an active region with a first surface and an isolated region surrounding it. The structure features a metal gate with multiple metal layers, where the ratio of the thinnest portion to the thickest portion of at least one of the layers exceeds 40%.

Career Highlights

Ting-Siang Su is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop innovative solutions that advance semiconductor technology.

Collaborations

He has collaborated with notable coworkers, including Chia-Yang Wu and Shiu-Ko JangJian. These partnerships have contributed to the successful development of his patents and innovations.

Conclusion

Ting-Siang Su's contributions to semiconductor technology through his patents demonstrate his expertise and commitment to innovation. His work continues to influence the industry and pave the way for future advancements.

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